VSP-G1 User Manual
This is the comprehensive User Manual for the VSParticle Generator One unit. The Quick Start Guide is available as a quick reference for standard operation of the G1 unit.
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VSParticle Generator One unit (VSP-G1)
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Introduction
Congratulations on your purchase of the VSParticle Generator One (VSP-G1). With the VSP-G1, easy production of inorganic nanoparticles from conductive materials is possible with control over size (1 atom to 20 nm) and production rate (xx – xx).
Designed for use by researchers studying material properties, the VSP-G1 allows flexibility in the use of different gases and electrode materials for a wider range of combinations. The closed system provides a safer production of nanoparticles and can easily be dismantled for safe transport of produced nanoparticles as well as for system cleaning and maintenance. The VSP-G1 system can be integrated into a larger system for more complex operating procedures.
The production rate depends on the energy input into the spark, and material properties of the electrode. The VSP-G1 operates up to 60W, which corresponds to ablation rates up to ~100 mg/h for e.g. Au. Particle size is a function of the production rate and the flow rate. The spark gap is controlled automatically, allowing continuous operation. The spark generator is designed for a broad operating window, making it suitable for applications ranging from cluster research to materials science.
User service is needed in two situations: Periodic cleaning and replacing of electrodes. In both activities can be performed with a safe, simple and fast (<20 mins) protocol.
The particles are made available as an aerosol, allowing the user to choose a suitable deposition method for his or her substrates. VSParticle can help select/develop a deposition system fitted to your specific needs.
• Electrodes can be replaced by user (requires opening and cleaning of reactor). • Mixing materials at the nanoscale by using electrodes of different materials. • High purity: Exposes materials: Stainless steel, PTFE, Viton. No polymers near ablation zone. Gas based production eliminates the need for chemicals/surfactants or precursors. • The output of the system consist out of gas stream filled with particles. There are no polluting by-products formed during production. • The reactor can easily be customized to allow cross flow, co-flow, through flow (standard) and combined configurations.
How to use this manual
This user manual provides instructions for the set-up, installation, operation and maintenance of a VSP-G1 unit. Before operating the VSP-G1 unit, please read the safety section carefully and pay attention to the warnings provided throughout the manual, indicated by the following symbols:
(symbols used in the manual)
| (Short index of manual and a 1 sentence summary of each chapter/section) |
A quick start guide is also included for faster set-up as part of the standard operating procedure. For more information regarding safety and more complex operations as well as troubleshooting and maintenance, please refer to this manual.
Technical Specifications
Power 110-240V AC Dimensions Casing ca. 52x30x20cm Reactor added height ca. 10cm Weight 19kg Gas inlet/outlet 10mm tubes (with Swagelok connectors) Display 16x2 characters Digital output RS232
Operating Window
Flow rate 1-30 L/min Gas Supported: Ar or N2 (recommended purity 5.0)
Unsupported: He, Ne, Xe, Kr
Contact VSParticle for the use of reactive gases such as air and H2.Electrode material Comes with Cu electrodes.
Various other metals (e.g. Ag, Au, Pt, W, Ni), semiconductors and carbon are possible.Primary particle size 1 atom to 20 nm Ablation rate ~0.01-100 mg/h (material dependent) Typical particle concentration 108-1011 cm-3
