VSP-G1 Quick Start Guide

This is the Quick Start Guide for standard operation of a VSP-G1 unit. For first time operators, detailed information or troubleshooting, please refer to the User's Manual.

See the "Operating the system" [hyperlink] chapter within the VSP-G1 User's Manual for a more detailed description of the standard procedure using a basic setup as a guide.

Prepare the system for production

1. Design/draw your flow diagram.
2. Assemble the setup according to your specifications. (Ensure that the reactor is closed and mounted [hyperlink to Mounting the reactor in the Setup chapter of the User's Manual] correctly!)
3. Check the connections.
4. Check the system for leak tightness and make adjustments if necessary. (See leak tightness protocol [hyperlink]) [insert note about pressure safety in the right margin here]

Start nanoparticle production

1. Check for leaks if any changes were made to the system (see step 4 of Prepare the system for production).
2. Power up all systems.
3. Ensure that the path to the exhaust is clear.
4. Begin gas flow.
5. Set target voltage and current using the dials on the VSP-G1.
6. Press the start button to begin production.

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Remove your sample
When the deposition system is full or when you’ve produced the desired amount of nanoparticles,

1. Stop particle production.
2. Flush the system [hyperlink] (9 x τ).
3. Stop the gas flow.
4. Take out your sample following the procedure for your deposition system.

Contact information

Last updated: Kate Groves 13:53, 18 October 2016 (CEST)