VSP-G1 Quick Start Guide: Difference between revisions

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== Standard Procedure ==
See the "Operating the system" chapter within the VSP-G1 User's Manual for a more detailed description of the standard procedure using a basic setup as a guide.
'''''Pre spark procedure'''''
* System is leak-tight
* An appropriate filter has been installed (HEPA or better)
* Overpressure protection is in place and functioning
* Check that all electrode connections are ok
* Make all the necessary modifications and settings <span style="background:#FFFF00">(confirm this is correct with Tobias)</span>


'''''Post spark procedure'''''
'''''Prepare the system for production'''''
* Stop particle production
# Design/draw your flow diagram.
* Flush system (9x of the system volume)
# Assemble the setup according to your specifications. (Ensure that the reactor is closed and mounted <span style="background:#00FF00">[hyperlink to Mounting the reactor in the Setup chapter of the User's Manual]</span> correctly!)
* Close off gas source
# Check the connections.
* Contain the (to be) exposed area
# Check the system for leak tightness and make adjustments if necessary. (See leak tightness protocol <span style="background:#00FF00">[hyperlink]</span>) <span style="background:#00FF00">[insert note about pressure safety in the right margin here]</span>


'''''Retrieving the produced nanoparticles'''''
'''''Start nanoparticle production'''''
# Check for leaks if any changes were made to the system (see step 4 of Prepare the system for production).
# Power up all systems.
# Ensure that the path to the exhaust is clear.
# Begin gas flow.
# Set target voltage and current using the dials on the VSP-G1.
# Press the start button to begin production.
<span style="background:#00FF00">[Insert stabilisation note in the right margin]</span>
'''''Remove your sample''''' <br> When the deposition system is full or when you’ve produced the desired amount of nanoparticles,
# Stop particle production.
# Flush the system <span style="background:#00FF00">[hyperlink]</span> (9 x τ).
# Stop the gas flow.
# Take out your sample following the procedure for your deposition system.


== Standard Configurations ==
== Standard Configurations ==

Revision as of 11:49, 18 October 2016

This is the Quick Start Guide for standard operation of a VSP-G1 unit. For first time operators, detailed information or troubleshooting, please refer to the User's Manual.


See the "Operating the system" chapter within the VSP-G1 User's Manual for a more detailed description of the standard procedure using a basic setup as a guide.

Prepare the system for production

  1. Design/draw your flow diagram.
  2. Assemble the setup according to your specifications. (Ensure that the reactor is closed and mounted [hyperlink to Mounting the reactor in the Setup chapter of the User's Manual] correctly!)
  3. Check the connections.
  4. Check the system for leak tightness and make adjustments if necessary. (See leak tightness protocol [hyperlink]) [insert note about pressure safety in the right margin here]

Start nanoparticle production

  1. Check for leaks if any changes were made to the system (see step 4 of Prepare the system for production).
  2. Power up all systems.
  3. Ensure that the path to the exhaust is clear.
  4. Begin gas flow.
  5. Set target voltage and current using the dials on the VSP-G1.
  6. Press the start button to begin production.

[Insert stabilisation note in the right margin]

Remove your sample
When the deposition system is full or when you’ve produced the desired amount of nanoparticles,

  1. Stop particle production.
  2. Flush the system [hyperlink] (9 x τ).
  3. Stop the gas flow.
  4. Take out your sample following the procedure for your deposition system.

Standard Configurations

Maintenance

Contact information